LG Display announced a new OLED deposition technique called FLiPP that replaces fine metal masks with photolithography. The method raises subpixel aperture ratio by up to 55%, resulting in 1.6 times higher brightness, 2.4 times longer lifespan and 13 percent lower power consumption, according to LG. Traditional OLED production uses fine metal masks as stencils, which limit aperture ratio and cause uniformity issues, and only about 30 percent of the organic material passes through the stencil. FLiPP employs ultraviolet light to pattern a photoresist layer on top of deposited organic material; the UV exposure hardens the areas that correspond to subpixels while a chemical bath removes the unexposed material. The process is repeated for red, green and blue subpixels to create the desired layout. LG reported that the technique yields 64 percent more usable motherglass for laptop‑sized panels, reducing waste and cost. An internal test used an entire 8.5‑generation motherglass measuring 2,200 mm × 2,500 mm. FLiPP is the first maskless OLED technique reported to reach large‑scale commercialization. Japan Display’s eLEAP method pioneered maskless photolithography, and LG has a partnership with the company. Visionox plans a similar approach for release next year, while TCL CSOT leads development of inkjet printing as an alternative OLED fabrication method. LG pledged 3 trillion won, approximately $2.15 billion, to begin production of FLiPP‑based OLED panels by the end of 2027. Laptops and monitors will be the initial products, with expansion to smartwatches and ultra‑large televisions later. LG said the approach aims to improve color volume and gamut while lowering power use, potentially expanding OLED adoption across device sizes.